Microlithography, 429-514 Marcel Dekker Inc. 1998 Author:J. Sheats編、J.Sheats他14名 Abstract:装置、光学、エッチング、レジストプロセス、材料などリソグラフィ全般に関する成書。担当:Chemistry of photoresist materials(フォトレジスト材料の化学)。ジアゾナフトキノン系ポジ型フォトレジストの溶解抑制機構、化学増幅系レジストの酸発生機構についても詳細に記述した。
Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology, 11-24,65-132,159-228 Marcel Dekker Inc. 1998 Author:S. Nonogaki, T. Ueno, and T. Ito Abstract:半導体デバイス作製にかかわるリソグラフィの初心者を対象にした本。担当:露光装置(ch.2)、フォトレジスト(ch.4)、X線リソグラフィ(ch.6)、電子線リソグラフィ(ch.7)、の解説。
PLASICS AGE ENCYCLOPEDIA<進歩編>, 60-68 プラスチックス・エージ 1996 Author:共著30名 Abstract:高分子の産業動向についてのまとめ。担当:プラスチック市場動向 エレクトロニクス-半導体デバイス。半導体に用いられる有機材料の観点からレジスト材料、バッファーコート材、パッケージ材料について解説した。
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